W5 3D Integration - Applications, Technology, Architecture, Design, Automation, and Test

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Workshop Description

3D Integration is a promising technology for extending Moore's momentum in the next decennium, offering heterogeneous technology integration, higher transistor density, faster interconnects, and potentially lower cost and time-to-market. To produce 3D chips, new capabilities are needed: process technology, architectures, design methods and tools, and manufacturing test solutions. The goal of this Workshop is to bring together researchers, practitioners, and others interested in this exciting and rapidly evolving field, in order to update each other on the latest state-of-the-art, exchange ideas, and discuss future challenges.

The last four editions of this workshop took place in conjunction with DATE 2009 to DATE 2012.

The call for papers (CFP) for the upcoming workshop to be held in conjunction with DATE 2013 is available here.

Topic Areas

You are invited to participate and submit your contributions to the DATE 2013 Friday Workshop on 3D Integration. The areas of interest include (but are not limited to) the following topics:

  • 3D technologies: chip-on-chip, micro-bumping, contactless, and through-silicon-vias interconnect
  • TSV formation, perm./temp. wafer (de-)bonding
  • 3D architectures and design space exploration
  • 3D combinations of logic, memory, analog, RF
  • Application, product, or test chip case studies
  • 3D design methods and EDA tools
  • Signal and power integrity, and ESD in 3D
  • Thermo(-mechanical) analysis and -aware design
  • Chip-package co-design for 3D
  • Test, design-for-test, and debug techniques for 3D
  • Wafer test access, KGD test, thin-wafer handling
  • Economic benefit/cost trade-off studies
  • Standardization initiatives

Submission Instructions

Submissions are invited in the form of (extended) abstracts not exceeding two pages. Submissions must be sent in as PDF file via the Welcome paper submission system: http://welcome.molesystems.com/DATE13-3D-WS/2013/. All submissions will be evaluated for selection with respect to their suitability for the workshop, originality, and technical soundness. Selected submissions can be accepted for regular or poster presentation. At the workshop, an Electronic Workshop Digest will be made available to all workshop participants, which will include all material that authors are willing to provide: abstract, paper, slides, poster, etc.

Paper Submission deadline November 25, 2012
Notification of Acceptance December 10, 2012
Camera-Ready Material due date February 22, 2013

The workshop program contains the following elements.

  • One invited keynote address
  • Two invited talk
  • Two sessions with in total eight regular presentations
  • Two poster sessions
  • One panel session

Agenda

Agenda

TimeLabelSession
08:30W5.1Session 1: Opening

Moderator:
Bjørn B. Larsen, NTNU, NO

08:30W5.1.1Welcome Address
Qiang Xu, The Chinese University of Hong Kong, HK

08:40W5.1.2Keynote Address: 3D IC Design and CAD Research: Challenges and Opportunities
Sung Kyu Lim, Georgia Tech, US

09:25W5.1.3Invited Talk: 3D IC Test Challenges and Solutions
Erik Jan Marinissen, IMEC, BE

10:00W5.2Session 2: Posters

Posters - coffee + tea break
10:00A NOVEL ON-CHIP TSV-BASED BANDPASS FILTER DESIGN
Khaled MOHAMED, Mentor Graphics, EG

10:00EXPLICIT AND UNCONDITIONALLY STABLE METHOD FOR THE FAST 3-D SIMULATION OF STAKED CHIP POWER DISTRIBUTION NETWORKS CONNECTED BY THROUGH SILICON VIA ARRAYS
Tadatoshi SEKINE and Hideki ASAI, Shizuoka University, JP

10:00LAYOUT-TECHNOLOGY INTERACTIONS AND OPTIMIZATION OF INTERPOSER BASED DESIGNS
Andy HEINIG and Uwe KNOECHEL, Fraunhofer IIS/EAS, DE

10:00PHYSICALLY BASED APPROACH OF SIMPLE COMPACT MODELING FOR 3D INTERCONNECT IN RF CIRCUITS
Fengyuan SUN1, Jean-Etienne LORIVAL1, Francis CALMON1 and christian GONTRAND2
1INL, FR; 2INSA/INL, FR

10:00MODELING OF 3D-IC FABRICATION STEP SEQUENCES
Armin GRUENEWALD, Kai HAHN and Rainer BRüCK, University of Siegen, DE

10:00TSV INTERPOSER FOR 3D WAFER LEVEL SYSTEM IN PACKAGES
M. Jürgen WOLF, Fraunhofer IZM, DE

10:00A NEW TSV TEST METHOD WITH BISECTION
huiyun LI, Shenzhen Institutes of Advanced Technology, CN

10:00WIOMING, A LOW POWER WIDEIO COMPATIBLE 3D CIRCUIT
Denis Dutoit, Pascal Vivet and Alexandre Valentian, CEA, FR

10:00ANALYZING 3D NOC OCCUPANCY AND LATENCY
Yan GHIDINI, Matheus MOREIRA, Thais WEBBER, Ney CALAZANS and Cesar MARCON, PUCRS, BR

10:30W5.3Session 3: Design, Manufacturing and Test of 3D-Ics

Moderator:
Haykel Ben Jamaa, CEA-LETI, FR

10:30W5.3.1Silicon Interposers with Through Silicon Vias - A Base Approach for 3D Wafer Level System Integration
Kai Zoschke1, Rene Puschmann1, Oswin Ehrmann2, Juergen Wolf1 and Klaus-Dieter Lang2
1Fraunhofer IZM, DE; 2Technical U of Berlin, DE

10:53W5.3.2Thermal-aware Energy Efficient Run-Time Incremental Mapping for 3-D Networks-on-Chips
Xiaohang Wang1, Mei Yang2, Yingtao Jiang2, Maurizio Palesi3 and Terrence Mak4
1Guangzhou Ins. of Adv. Tech., CN; 2U of Nevada, US; 3Kore U, IT; 4The Chinese University of Hong Kong, HK

11:15W5.3.33D MPSoC Design Using 2D EDA tools: Analysis of Parameters
Mohamad Jabbar1, Abir M’Zah2, Omar Hammami2 and Dominique Houzet3
1GIPSA-Lab/ENSTA Paristech, FR; 2ENSTA Paristech, FR; 3GIPSA-Lab, FR

11:38W5.3.4Pre-bond Test of TSVs in 3D SICs using Ring Oscillators
Yassine Fkih1, Pascal Vivet2, Bruno Rouzeyre3, Marie-lise Flottes3 and Giorgio Di Natale3
1CEA-Leti / LIRMM U Montpellier II, FR; 2CEA-Leti, FR; 3LIRMM U Montpellier II, FR

12:00W5Lunch Break

Buffet meal
13:00W5.4Session 4: Performance, Reliability and Cost Modelling of 3D Ics

Moderator:
Rishad A. Shafik, University of Bristol, UK

13:00W5.4.1MoNICA: A Performance- and Thermal-Aware Floorplan Tool for Heterogeneous 3D NoC-based MPSoCs
Felipe Frantz1, da Silva Matos2, Lioua Labrak1, Fabien Clermidy3, Ian O’Connor1, Luigi Carro2 and Altamiro Susin2
1Lyon Institute of Nanotechnology, FR; 2Federal U of Rio Grande do Sul, BR; 3CEA-Leti, FR

13:23W5.4.2Short-Circuit Current Free NEMFET Based Logic and NEMFET-MOS Hybrid 3D Memory
Marius Enachescu, Mihai Lefter, George Razvan Voicu and Sorin D. Cotofana, Delft U of Tech., NL

13:45W5.4.33D-COSTAR: A Cost Model for 3D Stacked Ics
Mottaqiallah Taouil1, Said Hamdioui1, Erik Jan Marinissen2 and Sudipta Bhawmik3
1Delft U of Tech., NL; 2IMEC, BE; 3Qualcomm, US

14:08W5.4.4WIOMING, a Low Power Wide IO compatible 3D circuit
Denis Dutoit, Pascal Vivet and Alexandre Valentian, CEA, FR

14:30W5.5Session 5: Posters

Posters - coffee + tea break
14:30A NOVEL ON-CHIP TSV-BASED BANDPASS FILTER DESIGN
Khaled MOHAMED, Mentor Graphics, EG

14:30EXPLICIT AND UNCONDITIONALLY STABLE METHOD FOR THE FAST 3-D SIMULATION OF STAKED CHIP POWER DISTRIBUTION NETWORKS CONNECTED BY THROUGH SILICON VIA ARRAYS
Tadatoshi SEKINE and Hideki ASAI, Shizuoka University, JP

14:30LAYOUT-TECHNOLOGY INTERACTIONS AND OPTIMIZATION OF INTERPOSER BASED DESIGNS
Andy HEINIG and Uwe KNOECHEL, Fraunhofer IIS/EAS, DE

14:30PHYSICALLY BASED APPROACH OF SIMPLE COMPACT MODELING FOR 3D INTERCONNECT IN RF CIRCUITS
Fengyuan SUN1, Jean-Etienne LORIVAL1, Francis CALMON1 and christian GONTRAND2
1INL, FR; 2INSA/INL, FR

14:30MODELING OF 3D-IC FABRICATION STEP SEQUENCES
Armin GRUENEWALD, Kai HAHN and Rainer BRüCK, University of Siegen, DE

14:30TSV INTERPOSER FOR 3D WAFER LEVEL SYSTEM IN PACKAGES
M. Jürgen WOLF, Fraunhofer IZM, DE

14:30A NEW TSV TEST METHOD WITH BISECTION
huiyun LI, Shenzhen Institutes of Advanced Technology, CN

14:30WIOMING, A LOW POWER WIDEIO COMPATIBLE 3D CIRCUIT
Denis Dutoit, Pascal Vivet and Alexandre Valentian, CEA, FR

14:30ANALYZING 3D NOC OCCUPANCY AND LATENCY
Yan GHIDINI, Matheus MOREIRA, Thais WEBBER, Ney CALAZANS and Cesar MARCON, PUCRS, BR

15:00W5.6Session 6: Invited Talk

Moderator:
Denis Dutoit, CEA-LETI, FR

15:00W5.6.1Expanding the Design-Manufacturing Interface for 3D IC
Juan Rey, Mentor Graphics, US

15:40W5.7Session 7: Panel Discussion

Moderator:
Pascal Vivet, CEA-Leti, FR

Panelists:
Panelists:
Paul Franzon1, Georg Kimmich2, Juan Rey3, Ravi Varadarajan4 and Milojevic Dragomir5
1University North Carolina, US; 2STEricsson, FR; 3Mentor Graphics, US; 4Atrenta, FR; 5IMEC, BE
16:40W5.8Close

Groups: