Silicon Photonic Microring Resonators: Design Optimization Under Fabrication Non-Uniformity
Asif Mirzaa, Febin Sunnyb, Sudeep Pasrichac and Mahdi Nikdastd
Department of Electrical and Computer Engineering, Colorado State University, Fort Collins, Colorado, USA
aasifmirz@colostate.edu
bpsfebin@colostate.edu
csudeep@colostate.edu
dmnikdast@colostate.edu
ABSTRACT
Microring resonators (MRRs) are very often considered as the primary building block in silicon photonic integrated circuits (PICs). Despite many advantages, MRRs are considerably sensitive to fabrication non-uniformity (a.k.a. fabrication process variations), necessitating the use of power-hungry compensation methods (e.g., thermal tuning) to guarantee their reliable operation. Moreover, the design space of MRRs is complicated and includes several highly correlated design parameters, preventing designers from easily exploring and optimizing the design of MRRs against fabrication process variations (FPVs). In this paper, for the first time, we present a comprehensive design space exploration and optimization of MRRs against FPVs. In particular, we indicate how physical design parameters in MRRs can be optimized during design time to enhance their tolerance to FPVs while also improving the insertion loss and quality factor in such devices. Fabrication results obtained by measuring multiple fabricated MRRs designed using our design optimization solution demonstrate a significant 70% improvement on average in MRRs tolerance to different FPVs. Such improvement indicates the efficiency of our novel design optimization solution in reducing the tuning power required for reliable operation of MRRs.
Keywords: Fabrication Process Variations, Silicon Photonics, Mciroring Resonators, Design for Reliability, Design Optimization.
