On Refining Standard Cell Placement for Self-aligned Double Patterning
Ye-Hong Chen, Sheng-He Wang and Ting-Chi Wang
Department of Computer Science, National Tsing Hua University, Hsinchu City 30013, Taiwan
ABSTRACT
In this paper, we study the problem of refining a standard cell placement for self-aligned double patterning (SADP), which asks to simultaneously refine a detailed placement and find a valid SADP layout decomposition such that both overlay violation and wirelength are as small as possible. We first present an algorithm that adopts the technique of white space insertion for an SADP-aware single-row cell placement problem. Based on the single-row algorithm, we then describe an approach to the addressed placement refinement problem. Finally, we report encouraging experimental results to support the efficacy of our approach.
