LVS Check for Photonic Integrated Circuits – Curvilinear Feature Extraction and Validation
Ruping Cao1, Julien Billoudet1, John Ferguson1, Lionel Couder1, John Cayo1, Alexandre Arriordaz1 and Ian O’Connor2
1Mentor Graphics Corp, USA.
2Lyon Institute of Nanotechnology, École Centrale de Lyon, France
This work is motivated by the demand of an electronic design automation (EDA) approach for the emerging ecosystem of the photonic integrated circuit (PIC) technology. A reliable physical verification flow cannot be achieved without the adaption of the traditional EDA tools to the photonic design verification needs. We analyze how layout versus schematic (LVS) checking is performed differently for photonic designs, and propose an LVS flow that addresses the particular need of curvilinear feature validation (curved path length and bend curvature extraction). We show that it is possible to reuse and extend the current LVS tools to perform such critical but nontraditional checks, which ensures a more reliable photonic layout implementation in term of functionality and circuit yield. Going forward, we propose possible future studies that can further improve the flows.
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