9.1 Special Day on "Silicon Photonics": Advancements on Silicon Photonics

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Date: Thursday 12 March 2020
Time: 08:30 - 10:00
Location / Room: Amphithéâtre Jean Prouve

Chair:
Gabriela Nicolescu, Polytechnique Montréal, CA

Co-Chair:
Luca Ramini, Hewlett Packard Labs, US

TimeLabelPresentation Title
Authors
08:309.1.1SYSTEM STUDY OF SILICON PHOTOHOTONICNICS MODULATOR IN SHORT REACH GRIDLESS COHERENT NETWORKS
Speaker:
Sadok Aouini, Ciena Corporation, CA
Authors:
Sadok Aouini1, Ahmad Abdo1, Xueyang Li2, Md Samiul Alam2, Mahdi Parvizi1, Claude D'Amours3 and David V. Plant2
1Ciena Corporation, CA; 2McGill University, CA; 3University of Ottawa, CA
Abstract
A study the impact of modulation loss of Silicon-Photonics Mach-Zehnder modulators in the context of single-carrier coherent receivers, i.e. 400G-ZR. The modulation loss is primarily due to limited bandwidth and large peak to overage ratio of the modulator output. We present the implications of performing only post-compensation of the loss at the receiver and its advantages in gridless-networks. A manageable Q factor penalty of around 0.5 dB is found for dual- polarization system with a 0.75 dB peak to average ratio (PAPR) reduction.

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09:009.1.2FULLY INTEGRATED PHOTONIC CIRCUITS ON SILICON BY MEANS OF III-V/SILICON BONDING
Author:
Florian Denis-le Coarer, SCINTIL Photonics, US
Abstract
This presentation introduces a new platform integrating heterogeneous III-V/silicon gain devices at the backside of silicon-on-insulator wafers. The fabrication relies on commercial silicon photonic processes. This platform enables fully photonic integrated circuits comprising lasers, modulators, passives and photodetectors, that can be tested at the wafer level.
09:309.1.3III-V/SILICON HYBRID LASERS INTEGRATION ON CMOS-COMPATIBLE 200MM AND 300MM PLATFORMS
Speaker:
Karim Hassan, CEA-Leti, FR
Authors:
Karim Hassan1, Szelag Bertrand1, Laetitia Adelmini1, Cecilia Dupre1, Elodie Ghegin2, Philippe Rodriguez1, Fabrice Nemouchi1, Pierre Brianceau1, Antoine Schembri1, David Carrara3, Pierrick Cavalie3, Florent Franchin3, Marie-Christine Roure1, Loic Sanchez1, Christophe Jany1 and Ségolène Olivier1
1CEA-Leti, FR; 2STMicroelectronics, FR; 3Almae Technologies, FR
Abstract
We present a CMOS-compatible hybrid III-V/Silicon technology developed in CEA-Leti. Large-scale integration of silicon photonics is already available worldwide in 200mm or 300mm through different foundries, but the development of CMOS-compatible process for the III-V integration remains of major interest for next gen transceivers in the Datacom and High Performance Computing domains. The technological developments involve first the hybridization on top of a mature silicon photonic front-end wafer through direct molecular bonding, then the patterning of the III-V epitaxy layer, and low access resistance contacts though planar multilevel BEOL to be optimized. The different technological blocks will be described, and the results will be discussed on the basis of test vehicles based on either distributed feedback (DFB), distributed Bragg reflector (DBR), or Fabry-Perot (FP) laser cavities. While first demonstrations have been obtained through wafer bonding, we show that the fabrication process was subsequently validated on III-V dies bonding with a fabrication yield of Fabry-Perot lasers of 97% in 200mm. The overall technological features are expected improve the efficiency, density, and cost of silicon photonics PICs.
10:00End of session