Date: Thursday 30 March 2017
Time: 14:00 - 15:30
Location / Room: 3A
Chair:
Mark Po-Hung Lin, National Chung Cheng University, TW
Co-Chair:
Ibrahim Elfadel, Masdar Institute of Technology, AE
This session focuses on issues related to timing and layout in the presence of manufacturing variability and photolithographic limitations. The first paper reduces pessimism in timing analysis by estimating path sensitization while accounting for delay variations. The second paper enables patterning with reduced wirelength and overlay violation through placement refinement. The third paper improves manufacturability with an optimization algorithm for cut locations in line-end process. The last paper discusses clock tree synthesis to reduce delay sensitivity mismatch with gate delay circuitry.
| Time | Label | Presentation Title Authors |
|---|---|---|
| 14:00 | 11.4.1 | QUANTIFYING ERROR: EXTENDING STATIC TIMING ANALYSIS WITH PROBABILISTIC TRANSITIONS Speaker: Kevin Murray, University of Toronto, CA Authors: Kevin E. Murray1, Andrea Suardi2, Vaughn Betz1 and George Constantinides2 1University of Toronto, CA; 2Imperial College, GB Abstract Timing analysis is a cornerstone of the digital design process. Statistical Static Timing Analysis was introduced to reduce pessimism by modelling device delay variations. However it ignores circuit logic, which may cause some timing paths to never or only rarely be sensitized. We introduce a general timing analysis approach and tool to calculate the probability that individual timing paths are sensitized, enabling the calculation of bounding delay distributions over all input combinations. We show the connection to the well-known #SAT problem and present approaches to improve scalability, achieving average results 46 to 32% less pessimistic than Static Timing Analysis while running 14.6 to 44.0 times faster than Monte-Carlo timing simulation. Download Paper (PDF; Only available from the DATE venue WiFi) |
| 14:30 | 11.4.2 | ON REFINING STANDARD CELL PLACEMENT FOR SELF-ALIGNED DOUBLE PATTERNING Speaker: Ting-Chi Wang, National Tsing Hua University, TW Authors: Ye-Hong Chen, Sheng-He Wang and Ting-Chi Wang, National Tsing Hua University, TW Abstract In this paper, we study the problem of refining a standard cell placement for self-aligned double patterning (SADP), which asks to simultaneously refine a detailed placement and find a valid SADP layout decomposition such that both overlay violation and wirelength are as small as possible. We first present an algorithm that adopts the technique of white space insertion for an SADP-aware single-row cell placement problem. Based on the single-row algorithm, we then describe an approach to the addressed placement refinement problem. Finally, we report encouraging experimental results to support the efficacy of our approach. Download Paper (PDF; Only available from the DATE venue WiFi) |
| 15:00 | 11.4.3 | CUT MASK OPTIMIZATION FOR MULTI-PATTERNING DIRECTED SELF-ASSEMBLY LITHOGRAPHY Speaker: Wachirawit Ponghiran, School of Electrical Engineering, KAIST, KR Authors: Wachirawit Ponghiran1, Seongbo Shim2 and Youngsoo Shin3 1School of Electrical Engineering, KAIST, KR; 2Dept. of Electrical Engineering, KAIST, KR; 3KAIST, KR Abstract Line-end cut process has been used to create very fine metal wires in sub-14nm technology. Cut patterns split regular line patterns into a number of wire segments with some segments being used as actual routing wires. In sub-7nm technology, cuts are smaller than optical resolution limit, and a directed self-assembly lithography with multiple patterning (MP-DSAL) is considered as a patterning solution. We address cut mask optimization problem for MP-DSAL, in which cut locations are determined in such a way that cuts are grouped into manufacturable clusters and assigned to one of masks without MP coloring conflicts; minimizing wire extensions is also pursued in the process. Only a restricted version of this problem has been addressed before while we do not assume any such restrictions. The problem is formulated as ILP first, and a fast heuristic algorithm is also proposed for application to larger circuits. Experimental results indicate that the ILP can remove all coloring conflicts, and reduce total wire extensions by 93% on average compared to those obtained by the restricted approach. Heuristic achieves a similar result with less than 1% of coloring conflicts and 91% reduction in total wire extensions. Download Paper (PDF; Only available from the DATE venue WiFi) |
| 15:15 | 11.4.4 | CLOCK DATA COMPENSATION AWARE CLOCK TREE SYNTHESIS IN DIGITAL CIRCUITS WITH ADAPTIVE CLOCK GENERATION Speaker: Saibal Mukhopadhyay, Georgia Institute of Technology, US Authors: Taesik Na, Jong Hwan Ko and Saibal Mukhopadhyay, Georgia Institute of Technology, US Abstract Adaptive clock generation to track critical path delay enables lowering supply voltage with improved timing slack under supply noise. This paper presents how to synthesize clock tree in adaptive clocking to fully exploit the clock data compensation (CDC) effect in digital circuits. The paper first provides analytical proof of ideal CDC effect for ring oscillator based clock generation. Second, the paper analyzes non-ideal CDC effect in a gate dominated critical path and wire dominated clock tree design. The paper shows the delay sensitivity mismatch between clock tree and critical path can degrade CDC effect by analyzing timing slack under power supply noise (PSN). Finally, the paper proposes simple but efficient clock tree synthesis (CTS) technique to maximize timing slack under PSN in digital circuits with adaptive clock generation. Download Paper (PDF; Only available from the DATE venue WiFi) |
| 15:30 | IP5-11, 618 | TIMING-AWARE WIRE WIDTH OPTIMIZATION FOR SADP PROCESS Speaker: Youngsoo Song, KAIST, KR Authors: Youngsoo Song, Sangmin Kim and Youngsoo Shin, School of Electrical Engineering, KAIST, KR Abstract With the scaling of the minimum feature size, RC delay of interconnect is relatively getting more critical in next node technology. SADP is one of the popular processes used in sub-7nm technology. For SADP process, we can increase wire width using patterns formed by block mask, which can reduce wire resistance of critical nets. We determine the direction and length of each wire widening, so that the resulting layout is conflict-free. We convert this as a maximum weight independent set problem and solve this by formulating an ILP. For various test circuits, the wire resistance of critical nets was reduced on average by 18.5%, which led to 9.9% reduction in clock period. The wire width optimization in SADP process can give an insight into timing optimization through the enhancement of fabrication process. Download Paper (PDF; Only available from the DATE venue WiFi) |
| 15:30 | End of session Coffee Break in Exhibition Area On all conference days (Tuesday to Thursday), coffee and tea will be served during the coffee breaks at the below-mentioned times in the exhibition area. Tuesday, March 28, 2017
Wednesday, March 29, 2017
Thursday, March 30, 2017
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